This set of VLSI Multiple Choice Questions & Answers (MCQs) focuses on “BiCMOS Technology”.
1. MOS technology has more load driving capability.
Explanation: One of the disadvantage of MOS technology is it has limited load driving capabilities.
2. What is the disadvantage of MOS device?
a) limited current sourcing
b) limited voltage sinking
c) limited voltage sourcing
d) unlimited current sinking
Explanation: MOS devices have limited current sourcing and current sinking abilities.
3. What are the advantages of BiCMOS?
a) higher gain
b) high frequency characteristics
c) better noise characteristics
d) all of the mentioned
Explanation: BiCMOS provides higher gain, better noise and high frequency characteristics than MOS transistors.
4. What are the features of BiCMOS ?
a) low input impedance
b) high packing density
c) high input impedance
Explanation: Some of the features of BiCMOS are low input impedance, low packing density, unidirectional, high output drive current etc.
5. BiCMOS has low power dissipation.
Explanation: BiCMOS has high power dissipation and CMOS has low power dissipation.
6. CMOS is
d) none of the mentioned
Explanation: BiCMOS is unidirectional and CMOS is bidirectional.
7. In bipolar transistor, its quality can be improved by
a) increasing collector resistance
b) decreasing collector resistance
c) collector resistance does not affect the quality
d) decreasing gate resistance
Explanation: The quality of bipolar transistor can be improved by reducing the collector resistance, which can be done by using the additional layer of n+ subcollector.
8. BiCMOS can be used in
a) amplifyig circuit
b) driver circuits
c) divider circuit
d) multiplier circuit
Explanation: BiCMOS is more advantageous and improved than CMOS and it can be used in I/O and driver circuits.
9. Advantages of E-beam masks are
a) small feature size
b) larger feature size
c) looser layer
d) complex design
Explanation: The advantages of E-beam masks are it has tighter layer to layer registration and it has smaller feature sizes.
10. Which process is used in E-beam machines?
a) raster scanning
b) vector scanning
c) both of the mentioned
d) none of the mentioned
Explanation: The two approaches to the design of E-beam machines are raster scanning and vector scanning.
11. What is the feature of vector scanning?
c) easy handling
d) very simple design
Explanation: Vector scanning is faster but data handling involved is more complex. Vector scanning is done between the end points.
12. Which has high input resistance?
Explanation: CMOS technology has high input resistance and is best for constructing simple low-power logic gates.
13. BiCMOS has lower standby leakage current.
Explanation: BiCMOS has potential for high standby leakage current and has high power consumption compared to CMOS.
Sanfoundry Global Education & Learning Series – VLSI.
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