This set of VLSI Multiple Choice Questions & Answers (MCQs) focuses on “Sheet Resistance”.
1. Area A of a slab can be given as ____________
a) t * W
b) t / W
c) L * W
d) L * t
View Answer
Explanation: Area A of a uniform slab is given as the product of thickness t and width W of the slab. Its unit is (micrometer)2.
2. For 5 micron technology, What is the Rs value for a metal?
a) 0.03
b) 0.04
c) 0.02
d) 0.01
View Answer
Explanation: For a 5 micron technology, the Rs value for a metal is 0.03. It is the standard typical sheet resistance values.
3. For 2 micron technology, what is the Rs value for polysilicon?
a) 10-40
b) 20-50
c) 15-30
d) 15-100
View Answer
Explanation: For 2 micron technology, the Rs value for polysilicon is 15-30.
4. Which has higher Rs values?
a) n-diffusion
b) p-diffusion
c) n-diffusion & p-diffusion
d) none of the mentioned
View Answer
Explanation: The Rs values for p-diffusion is 2.5 times greater than that of the n-diffusion.
5. For 1.2 micron technology, what is the Rs value for diffusion?
a) 20-40
b) 20-45
c) 15-30
d) 25-50
View Answer
Explanation: For 1.2 micron technology, the Rs value for diffusion is 20-45.
6. What is the relationship between channel resistance and sheet resistance?
a) R = Rs
b) R = Z*Rs
c) R = Z/Rs
d) R = Rs/Z
View Answer
Explanation: The relationship between channel resistance and sheet resistance can be given as R = Z*Rs. Sheet resistance is a measure of the resistance of thin films that are nominally uniform in thickness.
7. Z can be given as the ration of ___________
a) lower channel by upper channel
b) upper channel by lower channel
c) all of the mentioned
d) none of the mentioned
View Answer
Explanation: Z (length to width) ratio can be given as the ratio of upper channel to lower channel. It is just a numerical quantity and has no unit.
8. Deposition of metal or silicon alloy can be done by ___________
a) sputtering
b) evaporation
c) sputtering and evaporation
d) deposition should not be made
View Answer
Explanation: Deposition of metal or silicon alloy can be done by either sputtering or evaporation. Sputtering is a process whereby particles are ejected from a solid target material due to bombardment of the target by energetic particles.
9. Deposition of metal can be done by co-evaporation.
a) true
b) false
View Answer
Explanation: Deposition of metal or silicon alloy can also be done by co-evaporation from the elements.
10. Processing of the device is better using ___________
a) polysilicon
b) silicides
c) polysilicon & silicides
d) none of the mentioned
View Answer
Explanation: Processing of the device is better using polysilicon than silicides even though the properties of silicides are better than polysilicon.
Sanfoundry Global Education & Learning Series – VLSI.
To practice all areas of VLSI, here is complete set of 1000+ Multiple Choice Questions and Answers.
