Advanced Machining Questions and Answers – PCM-Process Description

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This set of Advanced Machining Processes Multiple Choice Questions & Answers (MCQs) focuses on “PCM-Process Description”.

1. Which of the following is the first step in Photo chemical milling process?
a) Generation of photographic film
b) Etching the part
c) Removal of etchant
d) Photo resist stripping
View Answer

Answer: a
Explanation: Generation of photographic film using CAD drawings is the first step in PCM.
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2. What is the other name for photographic film generated in Photochemical milling?
a) Photo mask
b) Photo tool
c) Photo cover
d) Photo plate
View Answer

Answer: b
Explanation: The photographic film generated using CAD drawings, which is also called as Photo tool.

3. What is the next step after generation of Photo-tool?
a) Chemical cleaning
b) Coating of photo tool
c) None of the mentioned
d) All of the mentioned
View Answer

Answer: d
Explanation: After generation of photo-tool, it is applied to the chemically cleaned work surface.

4. What is the use of photo tool in Photochemical milling process?
a) Cleaning of work piece
b) Protection of surface against etching
c) Etching of part surface
d) None of the mentioned
View Answer

Answer: b
Explanation: In PCM, photo tool is applied as coating which act as stencil resist that protect the surface from etching.

5. Where are the photo tools applied on the surface of the work piece material?
a) On the top
b) On the bottom
c) All of the mentioned
d) None of the mentioned
View Answer

Answer: c
Explanation: Photo tools are applied in pairs- one on the top and one on the bottom like sandwiching work piece between photo layers.
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6. The photo tool is exposed to which light source, in order to form a replica of image of the required geometry?
a) Infrared sources
b) Ultraviolet source
c) Normal light source
d) None of the mentioned
View Answer

Answer: b
Explanation: Ultraviolet light sources are used to transfer the image of the required geometry on to the resist, precisely.

7. Which can be used as solutions which develop the photo resists in PCM?
a) Water
b) Alkaline solution
c) Hydrocarbons
d) All of the mentioned
View Answer

Answer: d
Explanation: In PCM, the solutions mentioned above can be used to develop the photoresist films on the surfaces.

8. What is the next step after creating the photo tool and adhering it to work piece using UV light source?
a) Finishing
b) Etching
c) Rinsing and drying
d) None of the mentioned
View Answer

Answer: b
Explanation: After the image is adhered to work piece, etching is done.

9. The right choice of etchant depend on, which of the following factors?
a) Rate of material removal
b) Etching depth
c) Cost and quality
d) All of the mentioned
View Answer

Answer: d
Explanation: Etchant selection depends on cost, quality, etch depth and MRR rate.
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10. After etching is done, what is the next step in Photochemical milling process?
a) Finishing
b) Rinsing and drying
c) Removal of protective layer
d) None of the mentioned
View Answer

Answer: b
Explanation: After etching is done in PCM, the parts are rinsed and dried.

11. How are the protective layer coatings on the parts are removed?
a) Use of chemicals
b) Mechanical techniques with chemicals
c) None of the mentioned
d) All of the mentioned
View Answer

Answer: d
Explanation: The protective layers are removed by the use of chemicals and by using mechanical techniques with chemicals.

Sanfoundry Global Education & Learning Series – Advanced Machining.

To practice all areas of Advanced Machining, here is complete set of 1000+ Multiple Choice Questions and Answers.

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Manish Bhojasia, a technology veteran with 20+ years @ Cisco & Wipro, is Founder and CTO at Sanfoundry. He is Linux Kernel Developer & SAN Architect and is passionate about competency developments in these areas. He lives in Bangalore and delivers focused training sessions to IT professionals in Linux Kernel, Linux Debugging, Linux Device Drivers, Linux Networking, Linux Storage, Advanced C Programming, SAN Storage Technologies, SCSI Internals & Storage Protocols such as iSCSI & Fiber Channel. Stay connected with him @ LinkedIn