Advanced Machining Questions and Answers – Chemical Milling – Introduction

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This set of Advanced Machining Processes Multiple Choice Questions & Answers (MCQs) focuses on “Chemical Milling – Introduction”.

1. In advanced machining processes, what is the full form of CHM?
a) Chemical machining
b) Chemical manufacturing
c) Chemical milling
d) None of the mentioned
View Answer

Answer: c
Explanation: In advanced machining processes, full form of CHM is Chemical milling.
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2. Of the following, which mechanism is used for the removal of material using Chemical milling process?
a) Material Vaporization
b) Chemical dissolution
c) Mechanical erosion
d) Mechanical abrasion
View Answer

Answer: b
Explanation: Chemical dissolution takes place in Chemical milling for the removing the material.

3. Which of the following solutions cannot be used as chemical reactive solution in CHM?
a) Acidic solution
b) Alkaline solution
c) Neutral solution
d) None of the mentioned
View Answer

Answer: c
Explanation: Both acidic or alkane solutions are used for chemical dissolution in Chemical milling.

4. By using Chemical machining, which of the following can be produced?
a) Pockets
b) Contours
c) Slots
d) All of the mentioned
View Answer

Answer: d
Explanation: By the use of CHM, pockets, contours, slots and materials having high strength to weight ratio can be machined.

5. Pre cleaning is done on the work piece surface in order to achieve, which of the following factors?
a) To provide good adhesion
b) To provide clean surface
c) To assure the absence of contaminants
d) All of the mentioned
View Answer

Answer: d
Explanation: All the factors mentioned above, are achieved thorough pre-cleaning process.
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6. Special coatings applied on work piece materials in order to protect them from chemical reaction are known as _________
a) Maskants
b) Protective coverings
c) Protective varnishing
d) None of the mentioned
View Answer

Answer: a
Explanation: The protective coatings on work pieces are known as Maskants.

7. Type of mask depends on which of the factor/s, given below?
a) Size of work piece
b) Number of parts
c) Desired resolution
d) All of the mentioned
View Answer

Answer: d
Explanation: All the factors mentioned above, are required to select the type of mask.

8. During Chemical milling, depth of etch is controlled by which factor of immersion?
a) Time
b) Mask method
c) Mask area
d) None of the mentioned
View Answer

Answer: a
Explanation: As the immersion time increases, depth of the etching increases.

9. What is the range of reagent temperatures used for chemical dissolution in CHM?
a) 12ᵒC to 35ᵒC
b) 37ᵒC to 85ᵒC
c) 90ᵒC to 101ᵒC
d) 121ᵒC to 142ᵒC
View Answer

Answer: b
Explanation: The optimum temperature of reagent used should range between 37ᵒC to 85ᵒC.
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10. In Chemical milling, excessive flow of chemical reagent results in which of the following defects?
a) Channellings
b) Grooves
c) Ridges
d) All of the mentioned
View Answer

Answer: d
Explanation: In Chemical milling, if the reagent flows excessively, then the defects mentioned above may occur.

11. State whether the following statement about Chemical milling is true or false.
“At higher temperatures, faster etching rates occur in Chemical milling.”
a) True
b) False
View Answer

Answer: a
Explanation: As the temperature increases, reaction rate increases which in turn increases etching rate in CHM.

12. Of the following, which ratio defines the etch factor?
a) Etching depth to undercut
b) Undercut to etching depth
c) Undercut to mask area
d) Mask area to undercut
View Answer

Answer: b
Explanation: Etch factor is defined as the ratio of undercut to etching depth.

13. CHM cannot eliminate which of the following defects?
a) Irregularities and dents
b) Surface scratches
c) Waviness
d) All of the mentioned
View Answer

Answer: d
Explanation: CHM is not a finishing process as that of MAF, there are some sort of defects in Chemical milling.
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Manish Bhojasia, a technology veteran with 20+ years @ Cisco & Wipro, is Founder and CTO at Sanfoundry. He is Linux Kernel Developer & SAN Architect and is passionate about competency developments in these areas. He lives in Bangalore and delivers focused training sessions to IT professionals in Linux Kernel, Linux Debugging, Linux Device Drivers, Linux Networking, Linux Storage, Advanced C Programming, SAN Storage Technologies, SCSI Internals & Storage Protocols such as iSCSI & Fiber Channel. Stay connected with him @ LinkedIn