Manufacturing Processes Questions and Answers – Electrochemical Etching – 16

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This set of Manufacturing Processes Multiple Choice Questions & Answers (MCQs) focuses on “Electrochemical Etching – 16”.

1. The configuration of the noble metal film is dependent on the deposition method used.
a) True
b) False
View Answer

Answer: a
Explanation: It is important to bear in mind that the morphology of the resulting noble metal films can vary with the deposition technique and the nature of the noble metal.
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2. The stability of the noble metal in the etchant is dependent on its nature.
a) True
b) False
View Answer

Answer: a
Explanation: Regarding the stability of the noble metal in the etchant, this is highly dependent on its nature and some noble metals can be oxidised and dissolved in the course of the etching process according to the existing relationship between the electrochemical potentials of the noble metal and the oxidant.

3. Which of the following particles, leads to pores or wires with heterogeneous geometric features?
a) Ag
b) Au
c) Cu
d) Cr
View Answer

Answer: a
Explanation: Ag particles dissolve and re-deposit during the etching process as a result of the relatively low electrochemical potential of silver. Therefore, Ag particles can change their shape and morphology during this process, leading to pores or wires with heterogeneous geometric features and morphologies with depth.
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4. Which of the following particles are used to produce pSi structures with well-defined geometric features?
a) Zn
b) Cd
c) Pd
d) Au
View Answer

Answer: d
Explanation: Usually, Au particles and films are preferably used to produce pSi structures with well-defined and precisely controlled geometric features and morphologies due to its stability in the etchant. For instance, Au meshes have been used to fabricate silicon wires of high aspect ratio (i.e. >200).

5. Illumination of light in metal-assisted etching of silicon affects the etching rate.
a) True
b) False
View Answer

Answer: a
Explanation: As far as the effect of light illumination in metal-assisted etching of silicon, this has a direct effect on the etching rate. It has been reported that the etching rates for p-type and n-type (100) silicon substrates of resistivity 1–10 Ω cm differ whether the etching process is conducted with or without illumination.
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6. The etching rate of silicon wafers under light illumination is much slower than under dark conditions.
a) True
b) False
View Answer

Answer: b
Explanation: The etching rate of p- and n-type silicon wafers under room light illumination is about 0.05 times faster than under dark conditions. This difference becomes even higher (i.e. 150 times faster) when 20 W illumination is used.

7. The faster etch rates of the silicon wafer under light illumination is due to photo-excited electronic holes.
a) True
b) False
View Answer

Answer: a
Explanation: The etching rate of p- and n-type silicon wafers under room light illumination is about 0.05 times faster than under dark conditions. This effect can be explained by the fact that under illumination the number of photo-excited electronic holes can be higher than the number of electronic holes injected from the oxidant agent, thus enabling faster etching rates.
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8. Metal assisted etching of silicon is dependent on the orientation of silicon atoms in the structure.
a) True
b) False
View Answer

Answer: a
Explanation: Actually, metal assisted etching of silicon is anisotropic and dependent on the crystallographic orientation of silicon. As an example, slanted porous silicon structures can be produced by etching (111) and (110) silicon wafers.

9. The etching of silicon atoms becomes more difficult for stronger back-bonds.
a) True
b) False
View Answer

Answer: a
Explanation: The back-bonds of the silicon atoms located on the surface of the substrate must be broken during the oxidation and dissolution of silicon. Therefore, the etching of silicon atoms becomes more difficult for stronger back-bonds. In that respect, it is worth noting that silicon atoms have one, two and three back-bonds in (100), (110) and (111) substrates.
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10. Intrinsic properties of silicon substrate have no effect in the metal assisted etching of Si.
a) True
b) False
View Answer

Answer: b
Explanation: The Important parameter affecting the resulting pSi structures produced by metal-assisted etching are the different intrinsic properties of the silicon substrate, which have a direct effect on the geometric features and characteristics of the resulting pSi structures.

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Manish Bhojasia - Founder & CTO at Sanfoundry
Manish Bhojasia, a technology veteran with 20+ years @ Cisco & Wipro, is Founder and CTO at Sanfoundry. He is Linux Kernel Developer & SAN Architect and is passionate about competency developments in these areas. He lives in Bangalore and delivers focused training sessions to IT professionals in Linux Kernel, Linux Debugging, Linux Device Drivers, Linux Networking, Linux Storage, Advanced C Programming, SAN Storage Technologies, SCSI Internals & Storage Protocols such as iSCSI & Fiber Channel. Stay connected with him @ LinkedIn | Youtube | Instagram | Facebook | Twitter